Substrate transfer device and substrate transfer m

专利名称：Substrate transfer device and substrate

transfer method

发明人：Jun Yamawaku,Junji Oikawa,Hiroyuki

Nakayama

申请号：US12726598申请日：20100318公开号：US08409328B2公开日：20130402

专利附图：

摘要：A substrate transfer device includes an atmosphere introduction unit and anatmosphere exhaust unit provided at a top and a bottom portion of a main body of the

device, respectively; and a substrate transfer mechanism provided between theatmosphere introduction unit and the atmosphere exhaust unit. The substrate transferdevice further includes a downward flow forming unit provided, adjacent to theatmosphere introduction unit, to allow an atmosphere to be introduced through theatmosphere introduction unit and to downwardly flow through the substrate transfermechanism and be exhausted through the atmosphere exhaust unit; and a gas ionizingunit for ionizing the atmosphere and a particle collecting unit for collecting particlesincluded in the atmosphere, the gas ionizing unit and the particle collecting unit beingsequentially provided in the direction in which the atmosphere downwardly flows,between the downward flow forming unit and the substrate transfer mechanism.

申请人：Jun Yamawaku,Junji Oikawa,Hiroyuki Nakayama

地址：Nirasaki JP,Nirasaki JP,Nirasaki JP

国籍：JP,JP,JP

代理机构：Rothwell, Figg, Erst & Manbeck, P.C.

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