Silicium-containing positive photoresist compositi

专利名称：Silicium-containing positive photoresist

compositions with 1,2 disulfones

发明人：SCHULZ, REINHARD, DR.,BARTMANN,

EKKEHARD, DR.,MUNZEL, HORST,DR.,WEHNER, GREGOR, DR.

申请号：EP89810101.9申请日：19890206公开号：EP0329610A3公开日：19900829

摘要：PURPOSE: To enable the stability and moreover, a high image separationperformance to be acquired by incorporating a specified 1,2-disulfonyl compound as asensitizer. CONSTITUTION: This positive photoresist composition comprises as essentialcomponents in an organic solvent, a silylized phenol resin and at least one kind ofsensitizer and, when needed, other conventional additives, and further, as a sensitizer, the1,2-disulfonyl compound represented by formula I in which each of R<1> and R<2> is,independently, a <=12C group optionally substituted each by a <=6C alkyl, alkoxy,alkylthio, aryl, aralkyl, heteroaryl, cyano, or nitro group, or a halogen atom or the like,thus permitting high separability and high plasma etching stability to be obtained.

申请人：CIBA-GEIGY AG

地址：Klybeckstrasse 141 4002 Basel CH

国籍：CH

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