专利名称：METHOD OF FORMING LOW-DIELECTRIC-CONSTANT FILM, AND SEMICONDUCTORSUBSTRATE WITH LOW-DIELECTRIC-CONSTANT FILM
发明人：KOMATSU, Michio Catalysts & Chem. Ind. Co.
Ltd.,NAKASHIMA, Akira Catalysts & Chem.Ind. Co. Ltd.,EGAMI, Miki Catalysts & Chem.Ind. Co. Ltd.,MURAGUCHI, Ryo Catalysts &Chem. Ind. Co. Ltd.
申请号：EP00981780.0申请日：20001215公开号：EP1197999B1公开日：20100217
摘要：Array
申请人：JGC CATALYSTS & CHEMICALS LTD
地址：JP
国籍：JP
代理机构：Towler, Philip Dean
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