Arrangement for holding a substrate in a material

专利名称：Arrangement for holding a substrate in a

material deposition apparatus

发明人：Johannes Krijne,Erwin Eiling,Karl-Heinz

Hohaus,Wolfgang Goergen,AndreasLovich,Marc Philippens,Richard

Scheicher,Ansgar Fischer,Martin Mueller

申请号：US13262776申请日：20100329公开号：US08808402B2公开日：20140819

专利附图：

摘要：An arrangement () for holding a substrate () in a material deposition apparatus,which substrate () has a deposition side () upon which material (M) is to be deposited, andwhich arrangement () comprises: a shadow mask () comprising a number of depositionopenings (Di); a support structure () comprising a number of surround openings (Si); and asupport structure holding means () for holding the support mask () and/or a substrateholding means () for holding the substrate (), such that the support structure () is on thesame side as the deposition side () of the substrate (), and the shadow mask () ispositioned between the substrate () and the support structure () such that at least onedeposition opening (Di) of the shadow mask () lies within a corresponding surroundopening (Si) of the support structure ().

申请人：Johannes Krijne,Erwin Eiling,Karl-Heinz Hohaus,Wolfgang Goergen,AndreasLovich,Marc Philippens,Richard Scheicher,Ansgar Fischer,Martin Mueller

地址：PH Best NL,BS Vaals NL,Linnich DE,Alsdorf DE,Augsburg DE,RegensburgDE,Thierhaupten DE,Königsbrunn DE,Untermeitingen DE

国籍：NL,NL,DE,DE,DE,DE,DE,DE,DE

代理机构：Cozen O'Connor

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